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H4.06 - New P- and N-type Skutterudites with ZT>1 and Practically Identical Thermal Expansion and Mechanical Properties 
April 3, 2013   9:45am - 10:00am

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High Resolution Topography Characterization at Die-Scale of Front End CMP Processes
Reducing Density-induced CMP Non-uniformity for Advanced Semiconductor Technology Nodes
Slurry Compositions for Polishing Several New Barrier Films
Fluorescence Correlation Spectroscopic Investigation of Surface Adsorption of CMP Slurry Additives on Abrasive Particles
Characterization of Chemically Modified Thin Films for Optimization of Metal CMP Applications