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EEE4.05 - Mango Plantations and Dairy Farms: A Cross-Cultural RET Site Program with the University of Wisconsin-Madison and the University of Puerto Rico-Mayaguez 
April 3, 2013   2:45pm - 3:00pm

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Al CMP for Low Resistance Gate Fill for 20nm and Beyond Replacement Metal Gate
High Resolution Topography Characterization at Die-Scale of Front End CMP Processes
Reducing Density-induced CMP Non-uniformity for Advanced Semiconductor Technology Nodes
Slurry Compositions for Polishing Several New Barrier Films
Characterization of Chemically Modified Thin Films for Optimization of Metal CMP Applications