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X4.01 - Fifty Years of Moore's Law: Towards Fabrication at Molecular Dimensions 

In the last half century, critical dimensions in electronic devices have been reduced from micrometers to a few tens of nanometers on a pace that has been consistent for decades. Lithography now touches many areas of science ranging from electronics to biology and the life sciences. To continue on this remarkable path predicted in 1965 and to approach molecular scale pattern formation, new breakthroughs in patterning methods are needed. This talk will focus on new concepts, methods and materials, in particular efforts in directed self-assembly (DSA) and short wavelength extreme ultraviolet (EUV) lithography. DSA harnesses the phase behavior of block copolymers to create patterns defined by the microstructure of the polymer. In contrast, EUV patterning enables the production of arbitrary patterns at similar length scales. These and other advances in lithography will be described. Biography Christopher Ober is the Francis Bard Professor of Materials Engineering at Cornell University. He received his B.Sc. in Honours Chemistry (Co-op) from the University of Waterloo, Canada in 1978 and his Ph.D. in Polymer Science & Engineering from the University of Massachusetts (Amherst) in 1982. Ober joined Cornell's Department of Materials Science and Engineering in 1986. Prior to that he was on the research staff at the Xerox Research Centre of Canada working on marking materials. He served as Interim Dean of the College of Engineering. He has pioneered new materials for photolithography and studies the biology materials interface. A Fellow of the ACS, APS and AAAS, his awards include the 2013 SPSJ International Award, the 2009 Gutenberg Research Award (Gutenberg University, Mainz), a Humboldt Research Prize in 2007 and the 2006 ACS Award in Applied Polymer Science. In 2014 he was a JSPS Fellow at TokyoTech. 

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