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Beyond Conventional Lithography: Patterning via self-organization and self-folding 
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Date/Time:
February 24, 2016   12:00pm - 1:30pm
 
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Pattern formation by self-organization and self-folding provides unique opportunities for the materials community by addressing many of the issues associated with conventional lithography. New approaches typically seek to control and pattern diverse materials across a range of length scales at low cost in a way that gives rise to new functionalities. This February, 2016 issue of the MRS Bulletin highlights recent progress in patterning approaches based on self-organization and self-folding. The presentations in this webinar will cover the important aspects of this topic, complementing the articles in the MRS Bulletin issue.
 


 
 
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