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LL1.02 - Passivation Coating on Electrospun Copper Nanowires for Stable Transparent Electrodes 
Date/Time:
April 22, 2014   8:30am - 8:45am
 
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Copper nanowire (CuNW) networks are one of the most promising candidates to replace indium tin oxide films as the premier transparent conducting electrode (TCEs) due to its high sheet resistance(Rs) -transmittance(T) performance, superior mechanical flexibility and low lost. However, the chemical activity of CuNWs causes a substantial increase in the Rs after thermal oxidation or chemical corrosion, which may undermine its applicability. In this work, we utilize atomic layer deposition(ALD) to coat a passivation layer onto electrospun copper nanowires and remarkably enhance their durability. The passivation layer is composed of 20-nm-thick aluminum-doped zinc oxide (AZO) for the inner layer and 1-nm-thick aluminum oxide for the outer layer. Without changing the optical transmittance, the passivated CuNW TCE shows an resistance increase of only 10% after thermal oxidation at 160 °C in dry air and 80 °C in humid air with 80% relative humidity, whereas the bare CuNWs quickly become insulating. In addition, the coating and baking of the acidic PEDOT:PSS layer increases the Rs of bare CuNW by 6 orders of magnitude, while the passivated CuNWs show an 18% increase. Our work demonstrates that this ALD method can greatly enhance the reliability of CuNW TCE and thus provide a practical solution for the degradation problem of metal nanowire TCEs.
 


 
 
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