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NN8.01 - Shape-Memory Surfaces with Tunable Nanopatterns for On-Demand Control of Cell Alignment 
April 3, 2013   1:30pm - 1:45pm

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High Resolution Topography Characterization at Die-Scale of Front End CMP Processes
Reducing Density-induced CMP Non-uniformity for Advanced Semiconductor Technology Nodes
Fluorescence Correlation Spectroscopic Investigation of Surface Adsorption of CMP Slurry Additives on Abrasive Particles
Characterization of Chemically Modified Thin Films for Optimization of Metal CMP Applications
Aggressive Diamond Characterization and Wear Analysis during Chemical Mechanical Planarization